Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium | 東京工業大学附属図書館資料名データベース

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Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

Editor(s), etc.:: editors, M.T. Swihart, M.D. Allendorf, M. Meyyappan
Title of ser.:: Electrochemical Society Proceedings Series
Ser. no.:: 2001-13
Pub. info.:: Pennington, N.J.: Electrochemical Society, 2001
ISSN:: 01616374
ISBN:: 9781566773195 [1566773199]
Call no.:: E23400/200113
Type:: Conference Proceedings

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Details

TDL ID:	ZA00014016
Series ID:	PA00000028
Conf. info.(Name):	Fundamental Gas-Phase and Surface Chemistry of Vaper-Phase Materials Synthesis ; Symposium on Process Control, Diagnostics and Modeling in Semiconductor Manufacturing
Conf. info.(Number):	2nd ; 4th
Conf. info.(Venue):	Washington, D.C., USA
Conf. info.(Date):	2001.00.00

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