1.

国際会議録
国際会議録
1. Ultra-Shallow Junction Formation Using Ion Implantation and Rapid Thermal Annealing: Physical and Practical Limits
Agarwal, A. ; Gossmann, H.-J.L. ; Fiory, A.T. ; Venezia, V.C. ; Jacobson, D.C.
出版情報: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.49-60,  2000.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-9
2.

国際会議録
国際会議録
2. Metal contamination issues resulting from new Si processes
Benton, J. L. ; Boone, T. ; Jacobson, D.C. ; Lin, Wen ; Wilk, G.D. ; Krautter, H. W. ; Rosamilia, J.M. ; Rafferty, C.S.
出版情報: Crystalline defects and contamination: their impact and control in device manufacturing III : DECON 2001 : proceedings of the Satellite Symposium to ESSDERC 2001, Nuremberg, Germany.  pp.181-191,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-29
3.

国際会議録
国際会議録
3. Thin Film Resistor Fabrication for lnP Technology Applications (Invited)
Kopf, R.F. ; Melendes, R. ; Jacobson, D.C. ; Tate, A. ; Melendes, M.A. ; Reyes, R.R. ; Hamm, R.A. ; Yang, Y. ; Frackoviak, J. ; Weimann, N.G. ; Maynard, H.L. ; Liu, C.T.
出版情報: State-of-the-art-program on compound semiconductors (STAPOCS XXXV) : proceedings of the international symposium.  pp.81-86,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-20