1.

国際会議録
国際会議録
1. Resolution enhancement technique optimization using model-based full-chip verification methodology for subwavelength lithography
Kim, J. ; Fan, M. ; Wang, L. ; Tsuei, T. ; Tang, Z.
出版情報: 24th Annual BACUS Symposium on Photomask Technology.  pp.1168-1177,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5567
2.

国際会議録
国際会議録
2. Full-chip level MEEF analysis using model based lithography verification [5992-95]
Kim, J. ; Wang, L. ; Zhang, D. ; Tang, Z.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922U-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
3.

国際会議録
国際会議録
3. Model-based full-chip verification for 65nm lithography process development [5853-42]
Kim, J. ; Wang, L. ; Zhang, D. ; Tang, Z.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.599-606,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853
4.

国際会議録
国際会議録
4. Contact CD variation check and contact/metal overlay check using a model based full chip verification software tool [5853-41]
Wang, L. ; Kim, J. ; Zhang, D. ; Tang, Z. ; Fan, M.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.589-598,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853