1.

国際会議録
国際会議録
1. Influence of Nitrogen or Argon Anneals on the Properties of SIMOX Wafers and Devices
Cristoloveanu, S. ; Ionescu, A. ; Wetteroth, T. ; Shin, H. ; Munteanu, D. ; Gentil, P. ; Hong, S. ; Wilson, S. R.
出版情報: Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A..  pp.213-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 446
2.

国際会議録
国際会議録
2. Solutions to Gate Oxide Integrity on TFSOI Substrates Caused by PMOS Threshold-Voltage Implant
Hong, S. Q. ; Wetteroth, T. ; Wilson, S. R. ; Steele, B. ; Schroder, D. K.
出版情報: Defect and impurity engineered semiconductors, II : symposium held April 13-17, 1998, San Francisco, California, U.S.A..  pp.417-,  1998.  Warrendale, Pa.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 510