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In-situ B Doping of Sii-xGex Film Epitaxially Grown on Si Using Ultraclean LPCVD

著者名:
Honma, F.
Murota, J.
Yoshida, T.
Goto, K.
Maeda, T.
Aizawa, K.
Sawada, Y.
さらに 2 件
掲載資料名:
Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1993-2
発行年:
1993
開始ページ:
171
終了ページ:
177
総ページ数:
7
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770743 [1566770742]
言語:
英語
請求記号:
E23400/930161
資料種別:
国際会議録

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