150-nm mask fabrication using thin ZEP 7000 resist,GHOST,and dry etch for the MEBES 5000 pattern generator
- 著者名:
- kim,M.Y. ( PKL )
- Lee,H.
- Yoon,Y.J.
- Choi,B.-Y.
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4066
- 発行年:
- 2000
- 開始ページ:
- 243
- 終了ページ:
- 251
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- 言語:
- 英語
- 請求記号:
- P63600/4066
- 資料種別:
- 国際会議録
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