1.

国際会議録
国際会議録
1. Positive- and negative-tone water-processable photoresists: a progress report
Yamada,S. ; Medeiros,D.R. ; Patterson,K. ; Jen,W.-L.K. ; Rager,T. ; Lin,Q. ; Lenci,C. ; Byers,J.D. ; Havard,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Willson,C.G.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.245-253,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
2.

国際会議録
国際会議録
2. Design and study of water-soluble positive- and negative-tone imaging materials
Havard,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Medeiros,D.R. ; Patterson,K. ; Yamada,S. ; Willson,C.G.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.111-121,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
3.

国際会議録
国際会議録
3. Design of a positive-tone water-soluble resist
Havard,J.M. ; Frechet,J.M.J. ; Pasini,D. ; Mar,B. ; Yamada,S. ; Medeiros,D.R. ; Willson,C.G.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.437-447,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
4.

国際会議録
国際会議録
4. Resist materials for 157-nm microlithography: an update
Willson,C.G. ; Tran,H.V. ; Trinque,B.C. ; Chiba,T. ; Yamada,S. ; Sanders,D.P. ; Connor,E.F. ; Grubbs,R.H. ; Klopp,J.M. ; Frechet,J.M.J. ; Thomas,B.H. ; Shafer,G.J. ; DesMarteau,D.D. ; Conley,W. ; Willson,C.G.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.385-395,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345