1.

国際会議録
国際会議録
1. Positive- and negative-tone water-processable photoresists: a progress report
Yamada,S. ; Medeiros,D.R. ; Patterson,K. ; Jen,W.-L.K. ; Rager,T. ; Lin,Q. ; Lenci,C. ; Byers,J.D. ; Havard,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Willson,C.G.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.245-253,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
2.

国際会議録
国際会議録
2. Polymers for 157-nm photoresist applications:a progress report
Patterson,K. ; Yamachika,M. ; Hung,R. ; Brodsky,C.J. ; Yamada,S. ; Somervell,M.H. ; Osborn,B. ; Hall,D. ; Dukovic,G. ; Byers,J.D. ; Conley,W.E. ; Willson,C.G.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.365-374,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
3.

国際会議録
国際会議録
3. Design and study of aqueous processable positive-tone photoresists
Yamada,S. ; Owens,J. ; Rager,T. ; Nielsen,M. ; Byers,J.D. ; Willson,C.G.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.569-578,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999