1.

国際会議録
国際会議録
1. Deposition of High Quality SiO2 Films Using TEOS by ECR Plasma
Sano, K. ; Tamamaki, H. ; Nomura, M. ; Wickramanayaka, S. ; Nakanishi, Y. ; Hatanaka, Y.
出版情報: Ion-solid interactions for materials modification and processing : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.539-,  1996.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 396
2.

国際会議録
国際会議録
2. Evaluation of Reaction Dynamics of Film Depositions in Plasma CVDs by Using a Remote Plasma CVD System
Wickramanayaka, S. ; Kitamura, K. ; Nakanishi, Y. ; Hatanaka, Y.
出版情報: Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A..  pp.145-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 406
3.

国際会議録
国際会議録
3. Melting Evaporation and Recystallization of a-SiC:H Films by Excimer Laser
Wickramanayaka, S. ; Kitamura, K. ; Nakanishi, Y. ; Hatanaka, Y.
出版情報: Advanced laser processing of materials - fundamentals and applications : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A..  pp.429-,  1996.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 397
4.

国際会議録
国際会議録
4. Deposition of Thin SiO2 Films on Polymers as a Hard-Coating Using a Microwave-ECR Plasma
Sano, K. ; Tamamaki, H. ; Nomura, M. ; Wickramanayaka, S. ; Nakanishi, Y. ; Hatanaka, Y.
出版情報: Microwave processing of materials V : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.647-,  1996.  Pittsburgh,, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 430