1.

国際会議録
国際会議録
1. Application of development-free vapor photolithography in etching silicon nitride
Hong,X. ; Duan,S. ; Lu,J. ; Wang,P. ; Chen,Y.
出版情報: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.478-486,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3331
2.

国際会議録
国際会議録
2. Curvature-based shape representation of planar curves
Chen,Y. ; Wang,P. ; Zhu,J. ; Zhou,J.
出版情報: Computer-aided design and computer graphics : Fourth International Conference on Computer-Aided Design and Computer Graphics : 23-25 October, 1995, Wuhan, China.  pp.79-84,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2644