1.

国際会議録
国際会議録
1. Etching analysis of inductively coupled plasma technology for fabrication of micro-optical elements
Wang, S. ; Zhou, C. ; Ru, H. ; Zhang, Y.
出版情報: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.84-93,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5645
2.

国際会議録
国際会議録
2. Deep-etched fused silica grating as a (de)multiplexer for DWDM application at the 1.55-pm wavelength
Zhang, Y. ; Zhou, C. ; Ru, H. ; Wang, S.
出版情報: Holography, diffractive optics, and applications II : 8-11 November 2004, Beijing, China.  pp.661-665,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5636
3.

国際会議録
国際会議録
3. A Study on Nanometer-Sized BaTiO3-Based Dielectric for Ni-MLCC with Y5V Specification
Ji, Z. ; Xiao, Z. ; Wang, S. ; Gu, Y. ; Zhou, C. ; Zhang, Y.
出版情報: PRICM 5 : the Fifth Pacific Rim International Conference on Advanced Materials and Processing, November 2-5, 2004, Beijing, China.  pp.1129-1132,  2005.  Uetikon-Zuerich.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 475-479(2)