1.

国際会議録
国際会議録
1. Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides
Verhaverbeke, S. ; Meuris, M. ; Mertens, P. ; Schmidt, H. ; Heyns, M.M. ; Philipossian, A. ; Graeff, D. ; Dillenbeck, K.
出版情報: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.199-219,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-13
2.

国際会議録
国際会議録
2. A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES
Meuris, M. ; Verhaverbeke, S. ; Mertens, P.W. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Heyns, M.M. ; Philipossian, A.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.15-25,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
3.

国際会議録
国際会議録
3. NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES
Heyns, M. M. ; Verhaverbeke, S. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. ; Kubota, M. ; Philipossian, A. ; Dillenbeck, K. ; Graf, D. ; Schnegg, A. ; Blank, R. de
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.35-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315