CHARACTERIZATION OF METAL-OXIDE-SILICON INTERFACE BY MONOENERGETIC POSITRON BEAM
- 著者名:
- 掲載資料名:
- Defect engineering in semiconductor growth, processing and device technology : symposium held April 26-May 1, 1992, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 262
- 発行年:
- 1992
- 開始ページ:
- 313
- 終了ページ:
- 318
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991576 [1558991573]
- 言語:
- 英語
- 請求記号:
- M23500/262
- 資料種別:
- 国際会議録
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Monoenergetic Positron Beam Studies of Near Surface Defects Induced by Low Dose Be-Implantation
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