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Analysis of the Tribological Mechanisms Arising in the Chemical Mechanical Polishing of Copper-Film Wafers.

著者名:
掲載資料名:
A.S.M.E. paper
シリーズ名:
ASME Technical Paper : TRIB
シリーズ巻号:
2003
発行年:
2003
通号:
2003-TRIB-241
ペーパー番号:
2003-TRIB-241
総ページ数:
19
出版情報:
New York, NY: American Society of Mechanical Engineers
言語:
英語
請求記号:
A11800
資料種別:
テクニカルペーパー

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