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Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node

著者名:
K. Yoshimochi ( NEC Electronics Corp. (Japan) )
T. Uchiyama ( NEC Electronics Corp. (Japan) )
T. Tamura ( NEC Electronics Corp. (Japan) )
T. Theeuwes ( ASML Netherlands B.V. (Netherlands) )
R. Peeters ( ASML Netherlands B.V. (Netherlands) )
H. van der Laan ( ASML Netherlands B.V. (Netherlands) )
H. Bakker ( ASML Netherlands B.V. (Netherlands) )
K. Morisaki ( ASML Japan Co., Ltd. (Japan) )
T. Oga ( Cymer Japan, Inc. (Japan) )
さらに 4 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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