Wet Etching Studies on Electron Cyclotron Resonance (ECR) Plasma Enhanced Chemical Vapor Deposited Silicon Nitride Films
- 著者名:
- 掲載資料名:
- Plasma processing XIII : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-6
- 発行年:
- 2000
- 開始ページ:
- 34
- 終了ページ:
- 41
- 総ページ数:
- 8
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772716 [1566772710]
- 言語:
- 英語
- 請求記号:
- E23400/2000-6
- 資料種別:
- 国際会議録
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SILICON NITRIDE DEPOSITED AT VERY LOW SILANE PRESSURES USING ELECTRON CYCLOTRON RESONANCE PLASMAS
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