Electrical Properties of Ultra Shallow p Junction on n Type Si Wafer Using Decaborane Ion Implantation

Electrical Properties of Ultra Shallow p Junction on n Type Si Wafer Using Decaborane Ion Implantation

著者名:

掲載資料名:

Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

686

発行年:

2002

開始ページ:

95

終了ページ:

100

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996229 [1558996222]

言語:

英語

請求記号:

M23500/686

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014562
シリーズID:	PA00000011
会議名:	Symposium on materials issues in novel si-based technology
回次:	2001
会議開催地:	Boston, MA, USA
会議開催年:	2001.11.26-2001.11.28

類似資料:

1 国際会議録 IMPROVING WETTABILITY OF POLYMETHYLMETHACRYLATE BY Ar+ ION IRRADIATION IN OXYGEN ENVIRONMENT Koh, Seok-Keun, Choi, Won-Kook, Cho, Jun-Sik, Song, Seok-Kyun, Jung, Hyung-Jin MRS - Materials Research Society	7 国際会議録 A Study on the Use of Multicast Protocol Traffic Overload for Active Network Choi, Won Hyuck, Jie, Min Seok Trans Tech Publications
2 国際会議録 Study on the Effect of RTA Ambient to Shallow N+/P Junction Formation using PH3 Plasma Doping Seung-woo Do, Byung-Ho Song, Ho Jung, Seong-Ho Kong, Jae-Geun Oh, Jin-Ku Lee, Min-Ae Ju, Seung-Joon Jeon, Ja-Chun Ku, … Materials Research Society	8 国際会議録 Ultra Shallow Junction Formation by Cluster Ion Implantation Matsuo, Jiro, Aoki, Takaaki, Goto, Ken-ichi, Sugii, Toshihiro, Yamada, Isao MRS - Materials Research Society
3 国際会議録 Molecular Design, Synthesis and Luminescent Properties of Erbium(III): Cored Supramolecular Complexes Based on Metalloporphyrins for Optical Amplification Oh, Jae Buem, Paik, Kyung Lim, Ka, Jae-Won, Roh, Soo-Gyun, Nah, Min Kook, Kim, Hwan Kyu Materials Research Society	9 国際会議録 Improving Adhesion of Polytetrafluoroethylene to Aluminum, Copper, and an Adhesive by Ar+ Irradiation with and without Oxygen Environment Koh, Seok-Keun, Park, Sung-Chul, Choi, Chang-Kyu, Song, Seok-Kyun, Jung, Hyung-Jin, Pae, Kook D. MRS - Materials Research Society
4 国際会議録 Ultra-Shallow P+/N Junction Formed By Plasma Ion Implantation Baek, S.K., Choi, C.J., Seong, T.-Y., Hwang, Hyunsang, Kim, H. K., Moon, D. W. Materials Research Society	10 国際会議録 Simple Detection of Binding Events Using an Anchoring Transition of Liquid Crystals on the Immobilized oligoDNAs Kim, Hak-Rin, Choi, Min-Geon, Kim, Joo-Eun, Choi, Eui-Yul, Oh, Sang-Wook, Kim, Jae-Hoon Materials Research Society
5 国際会議録 Characteristics of Ultra Shallow B Implantation With Decaborane Li, Cheng, Albano, Maria A., Gladczuk, Leszek, Sosnowski, Marek Materials Research Society	11 国際会議録 SILICIDED SHALLOW JUNCTION FORMATION USING ION IMPLANTATION AND THERMAL ANNEALING Rubin, Leonard M., Herbots, N., Hoffman, D., Ma, D. Materials Research Society
6 国際会議録 Effect of Ion Energy on Structural and Chemical Properties of Tin Oxide Film in Reactive Ion-Assisted Deposition (R-IAD) Cho, Jun-Sik, Choi, Won-Kook, Yoon, Ki Hyun, Cho, J., Yoon, Young-Soo, Jung, Hyung-Jin, Koh, Seok-Keun MRS - Materials Research Society	12 国際会議録 The Effects Of Nitrogen On Electrical And Structural Properties In TaSi xN y/SiO2/P-Si MOS Capacitors Suh, You-Seok, Heuss, Greg, Lee, Jae-Hoon, Misra, Veena Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12