1.

国際会議録
国際会議録
1. Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Maslow, M.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
出版情報: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.298-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4692
2.

国際会議録
国際会議録
2. Mighty high-T lithography for 65-nm generation contacts
Conley, W. ; Montgomery, P.K. ; Lucas, K. ; Litt, L.C. ; Maltabes, J.G. ; Dieu, L. ; Hughes, G.P. ; Mellenthin, D.L. ; Socha, R.J. ; Fanucchi, E.L. ; Verhappen, A. ; Wampler, K.E. ; Yu, L. ; Schaefer, E. ; Cassel, S. ; Kuijten, J.P. ; Pijnenburg, W. ; Wiaux, V. ; Vandenberghe, G.
出版情報: Optical Microlithography XVI.  Part Two  pp.1210-1219,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
3.

国際会議録
国際会議録
3. Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
出版情報: Optical Microlithography XV.  Part One  pp.515-529,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4691
4.

国際会議録
国際会議録
4. Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology
Socha, R.J. ; Van Den Broeke, D.J. ; Yu, L. ; Conley, W. ; Wu, W. ; Chen, J.F. ; Petersen, J.S. ; Gerold, D.J. ; van Praagh, J. ; Droste, R. ; Flagello, D.G. ; Hsu, S.D.
出版情報: Optical Microlithography XV.  Part One  pp.446-458,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4691
5.

国際会議録
国際会議録
5. Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node
Dieu, L. ; Fanucchi, E.L. ; Hughes, G.P. ; Maltabes, J.G. ; Mellenthin, D.L. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Socha, R.J. ; Wampler, K.E. ; Verhappen, A. ; Kiuten, J.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1227-1233,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
6.

国際会議録
国際会議録
6. Application of chromeless phase lithography (CPL) masks in ArF lithography
Kasprowicz, B.S. ; Progler, C.J. ; Wu, W. ; Conley, W. ; Litt, L.C. ; Van Den Broeke, D.J. ; Wampler, K.E. ; Socha, R.J.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1189-1201,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
7.

国際会議録
国際会議録
7. Application of CPL reticle technology for the 65- and 50-nm node
Conley, W. ; Broeke, D.J.V.D. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K. ; Nelson-Thomas, C.M. ; Roman, B.J. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Hsu, S.D. ; Schaefer, E. ; Cassel, S. ; Yu, L. ; Kasprowicz, B.S. ; Progler, C.J. ; Petersen, J.S. ; Gerold, D.J. ; Maslow, M.J.
出版情報: Optical Microlithography XVI.  Part One  pp.392-398,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
8.

国際会議録
国際会議録
8. 65-nm full-chip implementation using double dipole lithography
Hsu, S.D. ; Chen, J.F. ; Cororan, N. ; Knose, W.T. ; Broeke, D.J.V.D. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, C.M. ; Eurlings, M. ; Finders, J. ; Chiou, T.-B. ; Socha, R.J. ; Conley, W. ; Hsieh, Y.W. ; Tuan, S. ; Hsieh, F.
出版情報: Optical Microlithography XVI.  Part One  pp.215-231,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
9.

国際会議録
国際会議録
9. Contact hole reticle optimization by using interference mapping lithography (IML)
Socha, R.J. ; Van Den Broeke, D.J. ; Hsu, S.D. ; Chen, J.F. ; Laidig, T.L. ; Corcoran, N. ; Hollerbach, U. ; Wampler, K.E. ; Shi, X. ; Conley, W.
出版情報: Optical Microlithography XVII.  pp.222-240,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377
10.

国際会議録
国際会議録
10. Defect printability in CPL mask technology
Kuijten, J.-P. ; Verhappen, A. ; Pijnenburg, W. ; Conley, W. ; Litt, L.C. ; Wu, W. ; Montgomery, P. ; Roman, B.J. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Van Den Broeke, D.J. ; Schaefer, E. ; Cook, P.
出版情報: Optical Microlithography XVII.  pp.1032-1039,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377