High-power laser-plasma x-ray source for lithography | 東京工業大学附属図書館文献データベース

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High-power laser-plasma x-ray source for lithography

著者名:

Gaeta, C.J. ( JMAR Research, Inc. (USA) )

Maldonado, J.R.

Smith, H.I. ( Massachusetts Institute of Technology (USA) )

さらに 7 件

掲載資料名:

Emerging Lithographic Technologies VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4688

発行年:

2002

巻:

Part Two

開始ページ:

818

終了ページ:

833

総ページ数:

16

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

言語:

英語

請求記号:

P63600/4688

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012520
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2002 : 6th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.07

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