1.

国際会議録
国際会議録
1. Dual Spectral Source Rapid Isothermal Processing Assisted CVD as a Unique Activation and Limited Reaction Processing CVD Technique
Singh, R. ; Sharangpani, R. ; Chen, Y.
出版情報: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.213-218,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-5
2.

国際会議録
国際会議録
2. Rapid Photothermal Processing of High Dielectric Constant Materials
Singh, R. ; Chen, Y. ; DeBoer, S. ; Thakur, R.P.S.
出版情報: Proceedings of the Second International Symposium on Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues.  pp.204-208,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-8
3.

国際会議録
国際会議録
3. High Energy Photon Assisted Rapid Isothermal Processing Based Chemical Vapor Deposition
Singh, R. ; Sharangpani, R. ; Chen, Y.
出版情報: Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11.  pp.187-193,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-25
4.

国際会議録
国際会議録
4. High-Performance High-Dielectric-Constant Films Deposited by Dual Spectral Source Rapid Isothermal-Assisted Metalorganic Chemical Vapor Deposition (MOCVD)
Chen, Y. ; Singh, R. ; DeBoer, S. ; Thakur, R. P. S.
出版情報: Rapid thermal and integrated processing VI : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.133-,  1997.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 470
5.

国際会議録
国際会議録
5. Novel Applications of Rapid Photothermal Chemical Vapor Deposition
Singh, R. ; Parihar, V. ; Chen, Y. ; Poole, K. F. ; DeBoer, S. ; Thakur, R. P. S. ; Sharangpani, R. ; Vasudev, P. K.
出版情報: Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.339-,  1998.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 525
6.

国際会議録
国際会議録
6. How Rapid Isothermal processing Can Be a Dominant Semiconductor Processing Technology in the 21st Century
Singh, R. ; Sharangpani, R. ; Cherukuri, K. C. ; Chen, Y. ; Dawson, D. W. ; Poole, K. F. ; Rohatgi, A. ; Narayanan, S. ; Thakur, R. P. S.
出版情報: Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.81-,  1996.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 429