Weir, B.E. ; Alam, M.A. ; Silverman, P.J. ; Ma, Y.
出版情報:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.465-474, 2002. Pennington, NJ. Electrochemical Society
Krug, C. ; Baumvol, I.J.R. ; Stedile, F.C. ; Green, M.L. ; Klemens, F. ; Silverman, P.J. ; Sorsch, T.W. ; Alvarez, F. ; Hammer, P. ; Victoria, N.M.
出版情報:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.187-198, 2000. Pennington, N.J.. Electrochemical Society
Semiconductor heterostructures for photonic and electronic applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.. pp.449-454, 1993. Pittsburgh, Pa.. Materials Research Society
Weir, B.E. ; Alam, M.A. ; Silverman, P.J. ; Ma, Y.
出版情報:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.465-474, 2002. Pennington, NJ. Electrochemical Society
Nuclear and electron resonance spectroscopies applied to materials science : proceedings of the Materials Research Society Annual Meeting, November 1980, Copley Plaza Hotel, Boston, Massachusetts, U.S.A.. pp.357-358, 1981. New York, N.Y.. North Holland
Photomask and Next-Generation Lithography Mask Technology X. pp.990-1004, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
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