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Titanium silicide etching in sub-half-micron device technology

著者名:
  • Chooi,S.Y.M. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Sih,V.K.T. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Siah,S.-Y. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Ismail,Z. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Zhou,M.-S ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
掲載資料名:
Multilevel Interconnect Technology II
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3508
発行年:
1998
開始ページ:
191
終了ページ:
201
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429674 [0819429678]
言語:
英語
請求記号:
P63600/3508
資料種別:
国際会議録

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