1.

国際会議録
国際会議録
1. DIFFUSION OF Zn INTO GaAs0.6P0.4:Te FROM Zn-DOPED OXIDE FILMS BY RAPID THERMAL PROCESSING
Usami, A. ; Tokuda, Y. ; Shiraki, H. ; Ueda, H. ; Wada, T. ; Kan, H. ; Murakami, T.
出版情報: Rapid thermal processing of electronic materials : symposium held April 21-23, 1987, Anaheim California, U.S.A..  pp.393-400,  1987.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 92
2.

国際会議録
国際会議録
2. CONTACTLESS MEASUREMENTS OF SLIP LINES INTENTIONALLY INTRODUCED IN Si WAFERS DURING RAPID THERMAL PROCESSING
Usami, A. ; Shiraki, H. ; Fujiwara, H. ; Abe, R. ; Osamura, N. ; Ichimura, M. ; Wada, T.
出版情報: Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.215-222,  1991.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 224