1.

国際会議録
国際会議録
1. Effect of stress and dopant redistribution on trench-isolated narrow devices
Scott,G.S. ; Nouri,F. ; Rubin,M.E. ; Manley,M. ; Stolk,P.
出版情報: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.183-190,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4181
2.

国際会議録
国際会議録
2. Systematic methodology for optimizing the trade-off of polysilicon depletion versus boron penetration in sub-0.18-ｦﾌm surface-channel PMOS devices
Scott,G.S. ; Saha,S.K. ; Olsen,C.S. ; Nouri,F. ; Lutze,J. ; Rubin,M.E. ; Manley,M.
出版情報: Microelectronic Device Technology III.  pp.129-137,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3881