1.

国際会議録
国際会議録
1. Study of Pulsed RF DPN Process Parameters for 65 um node MOSFET Gate Dielectrics
Rothschild, A. ; Kraus, P.A. ; Chua, T.C. ; Nouri, F. ; Cubaynes, F.N. ; Veloso, A. ; Mertens, S. ; Date, L. ; Schreutelkamp, R. ; Schaekers, M.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.49-56,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
2.

国際会議録
国際会議録
2. Further Optimization of Plasma Nitridation of Ultra-thin Oxides for 65 nm 236 Node MOSFETs
Kraus, P.A. ; Chua, T.C. ; Rothschild, A. ; Cubaynes, F.N ; Veloso, A. ; Mertens, S. ; Date, L. ; Baue, T.M. ; Ahmed, K.Z. ; Campbell, J. ; Noun, F. ; Cruse, J. ; Schreutelkamp, R. ; Schaekers, M.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.236-243,  2004.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-01