*Soft X-rays for deep sub-100 nm lithography, with and without masks | 東京工業大学附属図書館文献データベース

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*Soft X-rays for deep sub-100 nm lithography, with and without masks

著者名:

Smith, Henry I.

Carter, D. J.D.

Hastings, J. T.

さらに 9 件

掲載資料名:

Materials issues and modeling for device nanofabrication : symposia held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

584

発行年:

2000

開始ページ:

11

出版情報:

Warrendale, Pa.: MRS-Materials Research Society

ISSN:

02729172

ISBN:

9781558994928 [1558994920]

言語:

英語

請求記号:

M23500/584

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018971
シリーズID:	PA00000011
会議名:	Materials Issues and Modeling for Device Nanofabrication : Symposium
回次:	1999
会議開催地:	Boston, MA, USA
会議開催年:	1999.11.30-1999.12.02

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1 国際会議録 Zone-plate array lithography(ZPAL):a new maskless approach Carter,D.J.D., Gil,D., Menon,R., Djomehri,I.J., Smith,H.L. SPIE - The International Society for Optical Engineering	7 国際会議録 100-nm node lithography with KrF? Ferri,J.E., Tyrrell,B., Astolfi,D.K., Yost,D., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Liu,H.Y., … SPIE-The International Society for Optical Engineering
2 国際会議録 Fabrication of membrane mask for next-generation lithography Kim,D., Lera,J.D., Cho,H., Moon,J. SPIE - The International Society for Optical Engineering	8 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering
3 国際会議録 Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication (Invited Paper) Menon, R., Gil, D., Carter, D.J.D., Patel, A., Smith, H.I. SPIE-The International Society for Optical Engineering	9 国際会議録 Patterning Sub-100 nm Features for Sub-Micron Devices Kavak, H., Goodberlet, J.G. Kluwer Academic Publishers
4 国際会議録 A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode Maldonado, J.R., Coyle, S.T., Shamoun, B., Yu, M., Thomas, T.N., Holmgren, D.E., Chen, X., DeVore, B., Scheinfein, M.R., … SPIE - The International Society of Optical Engineering	10 国際会議録 Advanced FIB mask repair technology for 100-nm/ArF lithography: II Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, … SPIE-The International Society for Optical Engineering
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