1.

国際会議録
国際会議録
1. Material design for immersion lithography with high refractive index fluid (HIF)
Kim, M. ; Kim, H. ; Shim, K. ; Jeon, J. ; Gil, M. ; Song, Y. ; Enomoto, T. ; Sakaguchi, T. ; Nakajima, Y.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.10-19,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
2.

国際会議録
国際会議録
2. Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121]
Fujimura, Y. ; Morimoto, J. ; Manoshiro, A. ; Shimizu, M. ; Takamizawa, H. ; Hashimoto, M. ; Shiratori, H. ; Horii, K. ; Yokoya, Y. ; Ohkubo, Y. ; Enomoto, T. ; Sakaguchi, T. ; Nagai, M.
出版情報: Photomask Technology 2006.  pp.634936-634936,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6349
3.

国際会議録
国際会議録
3. Design and development of next-generation bottom anti-reflective coatings for 45.nm process with hyper NA lithography [6153-96]
Nakajima, M. ; Sakaguchi, T. ; Hashimoto, K. ; Sakamoto, R. ; Klshioko, T. ; Takei, S. ; Enomoto, T. ; Nakajima, Y.
出版情報: Advances in Resist Technology and Processing XXIII.  pp.61532L-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6153