Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121]
- 著者名:
Fujimura, Y. Morimoto, J. Manoshiro, A. Shimizu, M. Takamizawa, H. ( Dai Nippon Printing Co., Ltd. (Japon) ) Hashimoto, M. Shiratori, H. Horii, K. Yokoya, Y. Ohkubo, Y. ( HOYA Corp. (Japan) ) Enomoto, T. Sakaguchi, T. Nagai, M. ( Nissan Chemical Industries (Japan) ) - 掲載資料名:
- Photomask Technology 2006
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6349
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 634936
- 終了ページ:
- 634936
- 総ページ数:
- 1
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- 言語:
- 英語
- 請求記号:
- P63600/6349
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |