Design and development of next-generation bottom anti-reflective coatings for 45.nm process with hyper NA lithography [6153-96]
- 著者名:
Nakajima, M. ( Nissan Chemical Industries, Ltd.(Japan) ) Sakaguchi, T. ( Nissan Chemical Industries, Ltd.(Japan) ) Hashimoto, K. ( Nissan Chemical Industries, Ltd.(Japan) ) Sakamoto, R. ( Nissan Chemical Industries, Ltd.(Japan) ) Klshioko, T. ( Nissan Chemical Industries, Ltd.(Japan) ) Takei, S. ( Nissan Chemical Industries, Ltd.(Japan) ) Enomoto, T. ( Nissan Chemical Industries, Ltd.(Japan) ) Nakajima, Y. ( Nissan Chemical Industries, Ltd.(Japan) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6153
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61532L
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- 言語:
- 英語
- 請求記号:
- P63600/6153
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Bottom anti-reflective coating for hyper NA process: theory, application, and material development
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |