Double pattern EDA solutions for 32nm HP and beyond
- 著者名:
G. E. Bailey ( Mentor Graphics Corp. (USA) ) A. Tritchkov ( Mentor Graphics Corp. (USA) ) J. Park ( Mentor Graphics Corp. (USA) ) L. Hong ( Mentor Graphics Corp. (USA) ) V. Wiaux ( IMEC (Belgium) ) E. Hendrickx ( IMEC (Belgium) ) S. Verhaegen ( IMEC (Belgium) ) P. Xie ( Mentor Graphics Corp. (USA) ) J. Versluijs ( IMEC (Belgium) ) - 掲載資料名:
- Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6521
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466402 [0819466409]
- 言語:
- 英語
- 請求記号:
- P63600/6521
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |