1.

国際会議録
国際会議録
1. Advanced process control for hyper-NA lithography based on CD-SEM measurement
T. Ishimoto ; K. Sekiguchi ; N. Hasegawa ; T. Maeda ; K. Watanabe ; G. Storms ; D. Laidler ; S. Cheng
出版情報: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6518
2.

国際会議録
国際会議録
2. Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
K. D'have ; T. Machida ; D. Laidler ; S. Cheng
出版情報: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6518
3.

国際会議録
国際会議録
3. Sources of overlay error in double patterning integration schemes
D. Laidler ; P. Leray ; K. D'havé ; S. Cheng
出版情報: Metrology, inspection, and process control for microlithography XXII.  1  pp.69221E-1-69221E-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6922