1.

国際会議録
国際会議録
1. Equipment and wafer modeling of batch furnaces by neural networks
Benesch,N. ; Schneider,C. ; Lehnert,W. ; Pfitzner,L. ; Ryssel,H.
出版情報: Process and equipment control in microelectronic manufacturing : 19-20 May 1999, Edinburgh, Scotland.  pp.2-12,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3742
2.

国際会議録
国際会議録
2. Application and cost analysis of scatterometry for integrated metrology
Benesch,N. ; Schneider,C. ; Pfitzner,L. ; Ryssel,H.
出版情報: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.25-32,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3743