1.

国際会議録
国際会議録
1. Studies of High-k Gate Dielectrics Deposited hy the Liquid Source Misted Chemical Deposition Method
Lee, D. ; Roman, P. ; Mumbauer, P. ; Grant, R. ; Horn, M. ; Ruzyllo, J.
出版情報: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.237-242,  2000.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-5
2.

国際会議録
国際会議録
2. Characterization of High-K Dielectrics Using the Non-Contact Surface Charge Profiler (SCP) Method
Roman, P. ; Lee, D. ; Mumbauer, P. ; Grant, R. ; Kamieniecki, E. ; Ruzyllo, J.
出版情報: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.187-192,  2000.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-5
3.

国際会議録
国際会議録
3. STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK
Chang, K. ; Shanmugasundaram, K. ; Lee, D.-O. ; Roman, P. ; Shallenberger, J. ; Chang, F.-M. ; Wang, J. ; Beck, R. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.78-85,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
4.

国際会議録
国際会議録
4. GAS-PHASE SURFACE CONDITIONING IN A HIGH-k GATE CLUSTER
Roman, P. ; Lee, D.-O. ; Wang, J. ; Wu, C.-T. ; Subramanian, V. ; Brubaker, M. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
出版情報: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.241-248,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-26
5.

国際会議録
国際会議録
5. Characterization of Thin Dielectric Layers using the Non-Contact Surface Charge Profiler (SCP) Method
Roman, P. ; Lee, D.D. ; Wang, J. ; Mumbauer, P. ; Grant, R. ; Tower, J. ; Kamieniecki, E. ; Lukasiak, L. ; Ruzyllo, aud J.
出版情報: Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium.  pp.207-212,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-13