1.

国際会議録
国際会議録
1. DETERMINATION OF NATIVE OXIDE REMOVAL IN CLUSTER COMPATIBLE DRY CLEANING SYSTEMS USING A SURFACE PHOTOVOLTAGE TECHNIQUE
Brubaker, M. ; Staffa, J. ; Roman, P. ; Fakhouri, S. ; Ruzyllo, J.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.408-414,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
2.

国際会議録
国際会議録
2. EFFECTS CONTROLLING INITIATION AND TERMINATION OF GAS-PHASE CLEANING REACTIONS
Staffa, J. ; Fakhouri, S. ; Brubaker, M. ; Roman, P. ; Ruzyllo, J.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.315-321,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
3.

国際会議録
国際会議録
3. GAS-PHASE SURFACE CONDITIONING IN A HIGH-k GATE CLUSTER
Roman, P. ; Lee, D.-O. ; Wang, J. ; Wu, C.-T. ; Subramanian, V. ; Brubaker, M. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
出版情報: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.241-248,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-26