Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications
- 著者名:
Klerk, J. ( ASML (Netherlands) ) Jorritsma, L. ( ASML (Netherlands) ) Setten, E. ( ASML (Netherlands) ) Droste, R. ( ASML (Netherlands) ) Jongh, R.C. ( ASML (Netherlands) ) Hansen, S.G. ( ASML (Netherlands) ) Smith, D. ( ASML (Netherlands) ) Kerkhof, M.A. ( ASML (Netherlands) ) Mast, F. ( ASML (Netherlands) ) Graeupner, P. ( Carl Zeiss SMT AG (Germany) ) Rohe, T. ( Carl Zeiss SMT AG (Germany) ) Kornitzer, K. ( Carl Zeiss SMT AG (Germany) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part Two
- 開始ページ:
- 822
- 終了ページ:
- 840
- 総ページ数:
- 19
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
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