Wolfe, D. ; Flock, K. ; Therrien, R. ; Johnson, R. ; Rayner, B. ; Gunther, L. ; Brown, N. ; Claflin, B. ; Lucovsky, G.
出版情報:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.343-, 1999. Warrendale, PA. MRS - Materials Research Society
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.495-504, 2000. Pennington, N.J.. Electrochemical Society