1.

国際会議録
国際会議録
1. Implications of wafer design for manufacturing practices on photomask manufacturing
Watts, A. ; Rankin, J. ; Magg, C.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.599227-599227,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
2.

国際会議録
国際会議録
2. Migration of 90-nm mask and wafer lithography learning into 130-nm mask production to improve performance and yield
Watts, A. ; Wang, Y.J. ; Rankin, J.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.324-330,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256