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A Comparative Study of Scaling Properties of MOS Transistors in CHE and CHISEL Injection Regime

著者名:
掲載資料名:
Proceedings of the Eleventh International Workshop on the Physics of Semiconductor Devices : (December 11-15, 2001)
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4746
発行年:
2002
巻:
VOL-1
開始ページ:
686
終了ページ:
689
総ページ数:
4
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445001 [0819445002]
言語:
英語
請求記号:
P63600/4746
資料種別:
国際会議録

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