1.

国際会議録
国際会議録
1. Metal contamination issues resulting from new Si processes
Benton, J. L. ; Boone, T. ; Jacobson, D.C. ; Lin, Wen ; Wilk, G.D. ; Krautter, H. W. ; Rosamilia, J.M. ; Rafferty, C.S.
出版情報: Crystalline defects and contamination: their impact and control in device manufacturing III : DECON 2001 : proceedings of the Satellite Symposium to ESSDERC 2001, Nuremberg, Germany.  pp.181-191,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-29
2.

国際会議録
国際会議録
2. The Application of Solid Source Diffusion in the Vertical Replacement-Gate (VRG) MOSFET
Oh, Sang-Hyun ; Hergenrdther, Jack ; Monroe, Don ; Nigam, T. ; Klemens, F.P. ; Kornblit, A. ; Mansfield, W.M. ; Baumaun, F.H. ; Gossmann, H.J. ; King, C.A. ; Kleiman, R, N. ; Vuong, H.-H. ; Weber, G.R. ; Rafferty, C.S.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B3.2-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
3.

国際会議録
国際会議録
3. Influence Of Vacuum Annealing on Native Si Point Defects
Gossmann, H.-J. ; Mogi, T.K. ; Rafferty, C.S. ; Stolk, P.A. ; Eaglesham, D.J. ; Luftman, H.S. ; Unterwald, F.C. ; Boone, T. ; Thompson, M.O. ; Poate, J.M.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.177-186,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5
4.

国際会議録
国際会議録
4. Dopant Diffusion in Si(100) Doping Superlattices During Thermal Nitridation and Vacancy Assisted Sb Precipitation
Mogi, T.K. ; Gossmann, H-J. ; Eaglesham, D.J. ; Rafferty, C.S. ; Lufiman, H.S. ; Unterwald, F.C. ; Boone, T. ; Poate, J.M. ; Thompson, M.O.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.145-152,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5
5.

国際会議録
国際会議録
5. Influence of Flouring and BF2 Implants on the Transient Enhanced Diffusion of Boron
Vuong, H-H. ; Gossmann, H.-J. ; Rafferty, C.S. ; Luftman, H.S. ; Unterwald, F.C. ; Jacobson, D.C. ; Ahrens, R.E ; Boone, T. ; Zeitzoff, P.M.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.6-12,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5