CHARACTERISTICS OF 56 MeV OXYGEN IMPLANTATION INTO Si AND III-V SEMICONDUCTORS
- 著者名:
Pearton, S.J. Jalali, B. Poate, J.M. Fox, J.D. Kemper, K.W. Magee, C.W. Jones, K.S. - 掲載資料名:
- Surface chemistry and beam-solid interactions : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 201
- 発行年:
- 1991
- 開始ページ:
- 271
- 終了ページ:
- 276
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990074 [1558990070]
- 言語:
- 英語
- 請求記号:
- M23500/201
- 資料種別:
- 国際会議録
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