1.

国際会議録
国際会議録
1. Low-Energy Implantation and Transient-Enhanced Diffusion: Physical Mechanisms and Technology Implications
Cowern, N. E. B. ; Collart, E. J. H. ; Politiek, J. ; Bancken, P. H. L. ; Berkum, J. G. M. van ; Larsen, K. Kyllesbech ; Stolk, P. A. ; Huizing, H. G. A. ; Pichler, P. ; Burenkov, A. ; Gravesteijn, D. J.
出版情報: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.265-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 469
2.

国際会議録
国際会議録
2. On the ｢紜symmetrical｢？Behavior of Transient Enhanced Diffusion in Pre-Amorphized Si Wafers
Alquier, D. ; Cowern, N. E. B. ; Pichler, P. ; Armand, C. ; Martinez, A. ; Mathiot, D. ; Omri, M. ; Claverie, A.
出版情報: Silicon front-end technology--materials processing and modelling, symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.67-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 532