1.

国際会議録
国際会議録
1. Optical proximity strategies for desensitizing lens aberrations
Petersen,J.S.
出版情報: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.254-265,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4404
2.

国際会議録
国際会議録
2. Analytical description of antiscattering and scattering bar assist features
Petersen,J.S.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.77-89,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
3.

国際会議録
国際会議録
3. Optical extension at the 193-nm wavelength
Zandbergen,P. ; McCallum,M. ; Amblard,G.R. ; Domke,W.-D. ; Smith,B .W. ; Zavyalova,L. ; Petersen,J.S.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.310-319,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
4.

国際会議録
国際会議録
4. Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask
Petersen,J.S. ; Williams,A.M. ; Rich,G.K. ; Miller,D.A. ; Martinez,A.M.,Jr.
出版情報: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.375-382,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3096
5.

国際会議録
国際会議録
5. Resolution and DOF improvement through the use of square-shaped illumination
Smith,B.W. ; Zavyalova,L. ; Smith,S.G. ; Petersen,J.S.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.408-419,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
6.

国際会議録
国際会議録
6. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
出版情報: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.73-89,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3741
7.

国際会議録
国際会議録
7. Imaging contrast improvement for 160-nm line features using subresolution assist features with binary,six percent ternary attenuated phase-shift mask with process-tuned resist
Kachwala,N. ; Petersen,J.S. ; Chen,J.F. ; Canjemi,M. ; McCallum,M.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.55-67,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
8.

国際会議録
国際会議録
8. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.38-54,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
9.

国際会議録
国際会議録
9. High-transmission attenuated PSM:benefits and limitations through a validation study of 33%,20%,and 6% transmission masks
Kachwala,N. ; Petersen,J.S. ; McCallum,M.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1163-1174,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
10.

国際会議録
国際会議録
10. Calibration of chemically amplified resist models
Byers,J.D. ; Petersen,J.S. ; Sturtevant,J.L.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.156-162,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724
11.

国際会議録
国際会議録
11. Removable organic antireflection coating
Sturtevant,J.L. ; Insalaco,L.J. ; Flaim,T. ; Krishnamurthy,V. ; Meador,J.D. ; Petersen,J.S. ; Eckert,A.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.738-746,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724
12.

国際会議録
国際会議録
12. Aberration evaluation and tolerancing of 193-nm lithographic objective lenses
Smith,B.W. ; Webb,J.E. ; Petersen,J.S. ; Meute,J.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.269-280,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
13.

国際会議録
国際会議録
13. Illumination pupil filtering using modified quadrupole apertures
Smith,B.W. ; Zavyalova,L. ; Petersen,J.S.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.384-394,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
14.

国際会議録
国際会議録
14. Examination of isolated and grouped feature bias in positive-acting chemically amplified resist systems
Petersen,J.S. ; Byers,J.D.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.163-171,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724
15.

国際会議録
国際会議録
15. Process development for 180-nm structures using interferometric lithography and i-line photoresist
Chen,X. ; Zhang,Z. ; Brueck,S.R.J. ; Carpio,R.A. ; Petersen,J.S.
出版情報: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.309-318,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3048
16.

国際会議録
国際会議録
16. Phase phirst! An improved strong-PSM paradigm
Levenson,M.D. ; Petersen,J.S. ; Gerold,D.G. ; Mack,C.A.
出版情報: 20th Annual BACUS Symposium on Photomask Technology.  pp.395-404,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4186
17.

国際会議録
国際会議録
17. Multiple pitch transmission and phase analysis of six types of strong phase-shifting masks
Gerold,D.J. ; Petersen,J.S. ; Levenson,M.D.
出版情報: Optical Microlithography XIV.  4346  pp.729-743,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346
18.

国際会議録
国際会議録
18. Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
Smith,M.D. ; Mack,C.A. ; Petersen,J.S.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.1013-1021,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
19.

国際会議録
国際会議録
19. Binary halftone chromeless PSM technology for λ/4 optical lithography
Chen,J.F. ; Petersen,J.S. ; Socha,R.J. ; Laidig,T.L. ; Wampler,K.E. ; Nakagawa,K.H. ; Hughes,G.P. ; MacDonald,S.S. ; Ng,W.
出版情報: Optical Microlithography XIV.  4346  pp.515-533,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346
20.

国際会議録
国際会議録
20. Advanced FTIR techniques for photoresist process characterization
Carpio,R.A. ; Byers,J.D. ; Petersen,J.S. ; Theiss,W.
出版情報: Metrology, Inspection, and Process Control for Microlithography XI.  pp.545-556,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3050
21.

国際会議録
国際会議録
21. Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography
Petersen,J.S. ; Socha,R.J. ; Naderi,A.R. ; Baker,C.A. ; Rizvi,S.A. ; BanDenBroeke,D. ; Kachwala,N. ; Chen,F. ; Laiding,S. ; Wampler,K.E. ; Caldwell,R.F. ; Takeuchi,S. ; Yamada,Y. ; Senoh,T. ; McCallum,M.
出版情報: Photomask and X-Ray Mask Technology V.  pp.503-520,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3412
22.

国際会議録
国際会議録
22. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I
Socha,R.J. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.
出版情報: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.617-641,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3546
23.

国際会議録
国際会議録
23. Design and analysis of manufacturable alternating phase-shifting masks
Gordon,R.L. ; Mack,C.A. ; Petersen,J.S.
出版情報: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.606-616,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3546
24.

国際会議録
国際会議録
24. Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
出版情報: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.288-303,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3546