1.

国際会議録
国際会議録
1. High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow
Joo, H.S. ; Seo, D.C. ; Kim, C.M. ; Lim, Y.T. ; Cho, S.D. ; Lee, J.B. ; Song, J.Y. ; Kim, K.M. ; Park, J.H. ; Jung, J.C. ; Shin, K.S. ; Bok, C.K. ; Moon, S.C.
出版情報: Advances in Resist Technology and Processing XXI.  pp.126-133,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
2.

国際会議録
国際会議録
2. Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology
Joo, H.-S. ; Seo, D.C. ; Kim, C.M. ; Lim, Y.T. ; Cho, S.D. ; Lee, J.B. ; Jeon, H.P. ; Park, J.H. ; Jung, J.C. ; Shin, K.S. ; Bok, C.K. ; Moon, S.-C.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.725-732,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039