New approach for 193-nm resist using modified cycloolefin resin
- 著者名:
Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (Korea) ) Seo, D.C. Kim, C.-M. Lim, Y.-T. Cho, S.-D. Lee, J.B. Joo,H.-S. Jeon, H.-P. Kim, S.-J. Jung, J.-C. ( Hynix Semiconductor, Inc. (Korea) ) Shin, K.-S. Kong, K.K. Yamada, T. ( Nagase ChemteX Corp. (Japan) ) - 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 120
- 終了ページ:
- 126
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
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9
国際会議録
Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
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SPIE-The International Society for Optical Engineering |
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