New resolution enhancement technology for manufacturing sub-100-nm technology
- 著者名:
Chung, D.-H. ( Smsung Electronics Co., Ltd. (Korea) ) Park, J.-Y. Lee, M.-K. Shin, I.-K. Choi, S.-W. Yoon, H.-S. Sohn, J.-M. Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1492
- 終了ページ:
- 1499
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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