1.

国際会議録
国際会議録
1. Resonance Ultrasonic Diagnostics of As-Grown and Process-Induced Defects in Cz Silicon
Belyaev, A. ; Tarasov, I. ; Ostapenko, S. ; Koveshnikov, S. ; Kochelap, V.A. ; Beyaev, A.E.
出版情報: High Purity Silicon VI : proceedings of the sixth International Symposium.  pp.660-669,  2000.  Bellingham, Wash..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-17
2.

国際会議録
国際会議録
2. Evaluation of the Properties of Polyurethane Pads and their Correlation to the Perfonnance in the CMP Process
Zantye, P. ; Sikder, A. ; Kumar, A. ; Belyaev, A. ; Tarasov, I. ; Ostapenko, S.
出版情報: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.182-189,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-21
3.

国際会議録
国際会議録
3. Evaluation of Mechanical and Tribological Behavior and Surface Characteristics of CMP Pads
Sikder, A.K. ; Irfan, I.M. ; Kumar, Ashok ; Belyaev, A. ; Ostapenko, S. ; Calves, M. ; Harmon, J.P. ; Anthony, J.M.
出版情報: Chemical-mechanical polishing 2001 -- advances and future challenges : symposium held April 18-20, 2001, San Francisco, California, U.S.A..  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 671