1.

国際会議録
国際会議録
1. Improving the performance of 193-nm photoresists based on alicyclic polymers
Patterson,K. ; Okoroanyanwu,U. ; Shimokawa,T. ; Cho,S. ; Byers,J.D. ; Willson,C.G.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.425-437,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
2.

国際会議録
国際会議録
2. Novel functional nortricyclene polymers and copolymers for 248-and 193-nm chemically amplified resists
Niu,Q.J. ; Frechet,J.M.J. ; Okoroanyanwu,U. ; Byers,J.D. ; Willson,C.G.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.113-123,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
3.

国際会議録
国際会議録
3. New single-layer positive photoresists for 193-nm photolithography
Okoroanyanwu,U. ; Shimokawa,T. ; Byers,J.D. ; Medeiros,D.R. ; Willson,C.G. ; Niu,Q.J. ; Frechet,J.M.J. ; Allen,R.D.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.92-103,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
4.

国際会議録
国際会議録
4. Defect printability for sub-0.18ｦﾌm design rules using 193-nm lithography process and binary OPC reticle
Phan,K.A. ; Spence,C.A. ; Schefske,J.A. ; Okoroanyanwu,U. ; Levinson,H.J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.773-780,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
5.

国際会議録
国際会議録
5. Process-induced defects in sub-0.15-ｦﾌm device patterning using 193-nm lithography
Okoroanyanwu,U. ; Pike,C. ; Levinson,H.J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.277-283,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
6.

国際会議録
国際会議録
6. Impact of optical absorption on process control for sub-0.15-ｦﾌm device patterning using 193-nm lithography
Okoroanyanwu,U. ; Levinson,H.J. ; Romero,J. ; Singh,B. ; Lee,S.-J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.781-790,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
7.

国際会議録
国際会議録
7. Defects and metrology of ultrathin resist films
Okoroanyanwu,U. ; Cobb,J.L. ; Dentinger,P.M. ; Henderson,C.C. ; Rao,V. ; Monahan,K.M. ; Luo,D. ; Pike,C.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.515-526,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
8.

国際会議録
国際会議録
8. Integration considerations for 130-nm device patterning using ArF lithography
Okoroanyanwu,U. ; Levinson,H.J. ; Yang,C.-Y. ; Pangrle,S.K. ; Schefske,J.A. ; Kent,E.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.423-434,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
9.

国際会議録
国際会議録
9. Issues and nonissues on a 193-nm step-and-scan system in production
Schefske,J.A. ; Kent,E. ; Okoroanyanwu,U. ; Levinson,H.J. ; Masud,C.R. ; Streefkerk,B. ; Hanzen,R. ; Brueback,J.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.460-471,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
10.

国際会議録
国際会議録
10. Monitoring photoacid generation in chemically amplified resist systems
Okoroanyanwu,U. ; Byers,J.D. ; Cao,T. ; Webber,S.E. ; Willson,C.G.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.747-757,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
11.

国際会議録
国際会議録
11. Ultrathin photoresists for EUV lithography
Rao,V. ; Cobb,J.L. ; Henderson,C.C. ; Okoroanyanwu,U. ; Bozman,D.R. ; Mangat,P.J. ; Brainard,R.L. ; Mackevich,J.
出版情報: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.615-626,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3676
12.

国際会議録
国際会議録
12. Protecting groups for 193-nm photoresists
Allen,R.D. ; Sooriyakumaran,R. ; Opitz,J. ; Wallraff,G.M. ; DiPietro,R.A. ; Breyta,G. ; Hofer,D.C. ; Kunz,R.R. ; Jayaraman,S. ; Shick,R. ; Goodall,B. ; Okoroanyanwu,U. ; Wilson,C.G.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.334-343,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724
13.

国際会議録
国際会議録
13. Spectroscopic characterization of acid mobility in chemically amplified resists
Jessop,J.L.P. ; Goldie,S.N. ; Scranton,A.B. ; Blanchard,G.J. ; Rangarajan,B. ; Okoroanyanwu,U. ; Subramanian,R. ; Templeton,M.K.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.161-170,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
14.

国際会議録
国際会議録
14. Manufacturability of the ultrathin resist process
Pike,C. ; Bell,S. ; Plat,M.V. ; King,P. ; Nguyen,K.B. ; Lyons,C.F. ; Levinson,H.J. ; Phan,K.A. ; Okoroanyanwu,U.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.328-333,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997