1.

国際会議録
国際会議録
1. Process-induced defects in sub-0.15-ｦﾌm device patterning using 193-nm lithography
Okoroanyanwu,U. ; Pike,C. ; Levinson,H.J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.277-283,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
2.

国際会議録
国際会議録
2. Defects and metrology of ultrathin resist films
Okoroanyanwu,U. ; Cobb,J.L. ; Dentinger,P.M. ; Henderson,C.C. ; Rao,V. ; Monahan,K.M. ; Luo,D. ; Pike,C.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.515-526,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
3.

国際会議録
国際会議録
3. Manufacturability of the ultrathin resist process
Pike,C. ; Bell,S. ; Plat,M.V. ; King,P. ; Nguyen,K.B. ; Lyons,C.F. ; Levinson,H.J. ; Phan,K.A. ; Okoroanyanwu,U.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.328-333,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997