1.

国際会議録
国際会議録
1. Improving the performance of 193-nm photoresists based on alicyclic polymers
Patterson,K. ; Okoroanyanwu,U. ; Shimokawa,T. ; Cho,S. ; Byers,J.D. ; Willson,C.G.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.425-437,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
2.

国際会議録
国際会議録
2. Novel functional nortricyclene polymers and copolymers for 248-and 193-nm chemically amplified resists
Niu,Q.J. ; Frechet,J.M.J. ; Okoroanyanwu,U. ; Byers,J.D. ; Willson,C.G.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.113-123,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
3.

国際会議録
国際会議録
3. New single-layer positive photoresists for 193-nm photolithography
Okoroanyanwu,U. ; Shimokawa,T. ; Byers,J.D. ; Medeiros,D.R. ; Willson,C.G. ; Niu,Q.J. ; Frechet,J.M.J. ; Allen,R.D.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.92-103,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
4.

国際会議録
国際会議録
4. Monitoring photoacid generation in chemically amplified resist systems
Okoroanyanwu,U. ; Byers,J.D. ; Cao,T. ; Webber,S.E. ; Willson,C.G.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.747-757,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333