Dynamic Mechanical Analysis (DMA) of CMP Pad Materials
- 著者名:
Li, Irene Forsthoefel, Kersten M. Richardson, Kathleen A. Obeng, Yaw S. Easter, William G. Maury, Alvaro - 掲載資料名:
- Chemical mechanical polishing 2000 -- fundamentals and materials issues : symposium held April 26-27, 2000, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 613
- 発行年:
- 2001
- 開始ページ:
- E7.3
- 出版情報:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995215 [1558995218]
- 言語:
- 英語
- 請求記号:
- M23500/613
- 資料種別:
- 国際会議録
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4
国際会議録
Mechanistic Aspects of the Relationship between CMP Consumables and Polishing Characteristics
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